Key facts
- The first components of an ASML next-generation High NA EUV chipmaking tool arrived at New York's Albany NanoTech Complex.
- The Albany NanoTech Complex is the only facility of its kind in North America.
- The tool costs approximately $400 million.
- The machine prints circuit patterns onto silicon wafers and is necessary for producing advanced processors.
- The facility expects the tool to be fully functional by the end of the year.
The first components of an ASML next-generation High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) chipmaking tool have arrived at New York state's Albany NanoTech Complex. The facility, described as the only one of its kind in North America, will utilize the advanced machine for research and development into future chip designs and manufacturing processes.
NY Creates oversees the NanoTech facility and has established partnerships with IBM, memory maker Micron, and Japanese chip equipment maker Tokyo Electron. The ASML tool, which costs approximately $400 million, prints circuit patterns onto silicon wafers and is considered essential for the production of future advanced processors as chipmakers continue to shrink the atomic-sized features within chips.
Dave Anderson, Director of NY Creates, stated that the arrival of the tool is transformative for U.S.-based R&D and positions the facility at the epicenter of next-generation technology development. The components delivered on Tuesday form the base of the tool's mainframe, with further deliveries expected in the coming weeks for assembly. Anderson anticipates the tool will be fully operational by the end of the year.