Intel to use ASML's next-gen EUV tool for Panther Lake chips

ASML confirmed that Intel is employing the High NA tools for specific layers of the Panther Lake processors. This collaboration will allow both companies to gather data and optimize the performance of the machines, which are crucial for shrinking chip features as the industry progresses.

The High NA EUV equipment represents a significant investment, costing around $400 million, which is twice the price of standard EUV machines. The technology is also known for its technical complexity in integration into production processes.

Intel, which uses its 18A manufacturing process for these chips, already employs ASML's standard EUV lithography machines. The company received its first High NA tool in 2024 at its research and development facility in Hillsboro, Oregon, where new manufacturing techniques are developed.